“Oculto”, 2016

Alice Quaresma


About the Artist

Alice Quaresma
1985

Alice Quaresma was born in Brazil in 1985 and she currently lives in New York. Alice has in her curriculum a number of awards, special projects invitations and residency programs, including the renowned Foam Talent Prize in Amsterdam. Alice already had her work published in major magazines, newspapers and websites in Brazil, Japan, US and Europe. Alice got her MFA from Pratt Institute in 2009 and she was selected as one of PS122 Exhibition Prize winners during that same year. She participates in exhibitions and residency programs in the USA, Europe and South America since 2006. Alice has been experimenting with materials that allow her photographs to be sensorial and playful, pushing the boundaries of photography as a flat surface. She uses acrylic paint, paper, tape and pencil over photo prints. As the same time, Alice Quaresma’s work explores the physical aspects of photography, she continues to use images from her personal photo archive to elaborate on the idea of displacement and identity. She uses the instability of the immigration condition as a main source of inspiration. Bringing improvisation and unexpected factors into her art practice. The experimental quality on the work is becoming stronger as she continues to deconstruct photographs. She is embracing the multiple possibilities that exist in the photographic spectrum. Source: Galeria Silvia Cintra + Box4


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